高融点金属イオンプレーティングのための電子加速型プラズマ

概要

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Discharge plasmas and electron beams for ion plating of refractory metals (especially, tungsten W) are researched. Then, two necessary conditions are required : a power concentration above 10 kW to hearth and a plasma production above a density of 1011/cc around the center of the plasma or the beam. First, a high energy electron beam (>10 keV) with a space charge limit (1A) can satisfy the power concentration, but the produced plasma density is too low because the ionization rate is very small. Next, a low voltage discharge in a gas can produce a plasma source with a sufficient density, but the power concentration to hearth is not effective (only about 1/4 of total discharge power). Therefore, the large discahrge current (>1000A) is required while the power loss and the discharge cathode emission become serious. To satisfy the two necessary conditions for ion plating of W, we propose to use an electron accelerated plasma in which the electrons are accelerated locally along a magnetic field, and have an energy of a few hundred electron volt and a current of several tens ampere.
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