Attenuated total reflection Fourier transform infrared spectroscopy study of the adsorption of organic contaminants on a hydrogen-terminated Si(111) surface in air
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概要
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The adsorption of organic contaminants on a hydrogen-terminated Si(111) surface was investigatedusing attenuated total reflection Fourier transform infrared spectroscopy. When thehydrogen-terminated Si(111) surface was exposed to dry air, the sharp Si–H monohydride peakbecame weaker and a broad component became visible in the lower wave-number region.Furthermore, a number of bands within the C–H stretching region were observed. The intensity ofthe sharp Si–H band was recovered to a certain extent and those of the broad component and theC–H bands decreased after the sample was rinsed in hexane. These results suggest that thecontamination by organic adsorbates is not accompanied by a chemical bond formation.
- American Institute of Physicsの論文
著者
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UOSAKI Kohei
Division of Chemistry, Graduate School of Science, Hokkaido University
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Uosaki Kohei
Division Of Chemistry Graduate School Of Science Hokkaido University
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Uosaki Kohei
Department Of Chemistry Faculty Of Science Hokkaido University
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