S043021 ナノインデンテーション法を用いたCrN薄膜の破壊靭性の評価([S04302]環境調和型の表面改質および薄膜コーティング(2))

概要

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The influence of bias voltage during deposition on the fracture toughness of CrN films was examined using nano indentation fracture (NIF) method using three kind of indenter. CrN film was deposited on an austenitic stainless steel substrate by arc ion plating method under various bias voltages. The load-depth curves of the films were obtained by nano indention method using three kind of indenter. The elastic modulus E and the strain energy difference before and after cracking AU were calculated from the load-depth curves, film thickness t and the diameter of ring-like through-thickness crack 2CR were also measured in order to determine the fracture toughness by NIF method. As a result, it was found that a flat tip triangular indenter was suitable to evaluate the fracture toughness of CrN film. In case of flat tip, the fracture toughness of CrN film decreased with increasing negative bias voltage during the deposition.
一般社団法人日本機械学会の論文
2011-09-11