MNM-P1-1 スパッタエッチングによるナノワイヤ状突起物の形成に及ぼすエッチング条件の影響(合同ポスターセッション P1 単結晶・多結晶シリコンの疲労寿命評価とメカニズムの解明)

概要

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It was newly discovered that nanowire and microwire shaped precipitates were formed on solution treated tool steel substrates using sputter etching technique by introducing distilled water in the chamber. To study the influence of sputter etching condition on the size of the nanowire and microwire, the tool steel substrates were sputter etched under a variety of etching conditions. The results showed that the size and height of the nanowire and microwire increases with increasing sputter etching time. X-ray diffraction analysis of the nanowire and microwire indicated that these consisted of CrC.
一般社団法人日本機械学会の論文
2010-10-12