2104 HCD方式によるDLC膜のドライ条件下のトライボロジー特性に及ぼす原料ガスの影響(薄膜・解析手法,一般講演)

概要

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A new film coating method based on a combination of hollow cathode discharge and glow discharge methods was developed in order to grow a DLC film on substrate of a dies for deep drawing and ironing process. One of features of HCD process was to be able to provide a uniform film thickness of DLC on inner surface of deep hole. When applying a new process to the surface of a small-sized dies, a surface had a uniform film thickness and high hardness and scratch force. Influence of reaction gas on tribological properties was studied with a pin-on-disk type tribometer. As a result, DLC film from methane gas superior in terms of anti-peeling off properties to that from acetylene gas because of its high hardness.
社団法人日本機械学会の論文
2008-04-20