412 LIGAプロセスを用いた微細形状パターン射出成形品の開発(5)(T03-3 マイクロナノ理工学:nmからmmまでのテクスチャリングの創成と機能(3),大会テーマセッション,21世紀地球環境革命の機械工学:人・マイクロナノ・エネルギー・環境)

概要

論文の詳細を見る
Microdevices having precise fine structures of range from several ten to several hundred micrometers have been developed by injection molding technology. In this case, it is necessary to produce a tool part with inversed shapes of the microstructures on microdevices. A side-wall inclination ranging from ten to twenty degrees becomes important to smoothly release the molded microdevices out of the injection mold, since the surface area of microdevice becomes large by downsizing its structures. Thus, an X-ray exposure system using synchrotron radiation has been developed as one of processes to produce a tool part for these microdevices. In this study, the exposure processes (i. e. a moving mask process and a multiple exposure process) were examined to produce micro channels having two kinds of different depth on PMMA (polymethylmethacrylate) plate. It was found that a sink area generated on the side-wall of deep channel having an optional inclination at the confluence area of those channels on the PMMA plate for each of the processes.
社団法人日本機械学会の論文
2008-08-02