大型ウエハ対応・原子間力顕微鏡の研究 : 第1報,粗微動併用XYステージの応用(機械力学,計測,自動制御)

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We have developed a new type AFM (Atomic force microscopy) for semiconductor wafer testing with coarse-fine movement mechanisms, coarse XY stage and fine xy scanner. XY scanner was used both sample positioning and AFM scanning, A unique birds-beak type z-scanner was designed to be constructed with an optical microscope. Firstly we examined basic characteristics of each positioning mechanisms, 20mm positioning with coarse-fine control in 0.25s, 2nm step moving with xy scanner. Secondary the resolution of the AFM system with 0.3nm and the frequency response with 1kHz in AFM operation were measured. Finally as AFM observations, a compact disc surface and bare-Si surface of 0.19nm Ra were clearly measured. We confirmed the usefulness of the new AFM mechanism.
2006-08-25