Thermal Properties of Amorphous Si_3N_4-C Composites Prepared by Chemical Vapor Deposition
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概要
- 論文の詳細を見る
Thermal properties of amorphous Si_3N_4 containing carbon prepared by chemical vapor deposition were measured in the range of 20°to 900℃ by a laser flash method. The thermal diffusivity and thermal conductivity of the amorphous CVD Si_3N_4 with high carbon content are lower than those of amorphous CVD Si_3N_4. The specific heat of the amorphous CVD Si_3N_4-C composite is independent of the carbon content. The structure of the amorphous CVD Si_3N_4-C composite is discussed in terms of the temperature dependence of the thermal conductivity.
- 東北大学の論文
著者
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Hirai Toshio
The Research Institute For Iron Steel And Other Metals
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Goto Takashi
The Research Institute For Iron Steel And Other Metals
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Hayashi Shinsuke
The Research Institute for Iron, Steel and Other Metals
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Hayashi Shinsuke
The Research Institute For Iron Steel And Other Metals
関連論文
- Th-ThC Phase Diagram
- Preferred Orientation in Pyrolytic Graphite
- Siliconated Pyrolytic Graphite : Part 1. Preparation and Some Properties
- Chemical Bond of CVD-Si_3N_4 by Compton Scattering Measurement
- Siliconated Pyrolytic Graphite : Part 4. Electrical Resistivity
- Microstructure and Density of Pyrolytic Graphite
- Mechanism of the Pyrolytic Graphite Formation
- Preparation and Thermal Expansion of Pyrolytic Graphite-Bromine Residual Compounds
- The Electrical Anisotropies of Pyrolytic Graphite and Its Compounds
- Siliconated Pyrolytic Graphite : Part 2. The State of Silicon Present in Siliconated Pyrolytic Graphite
- Siliconated Pyrolytic Graphite : Part 3. Structural Features
- Thermal Properties of Amorphous Si_3N_4-C Composites Prepared by Chemical Vapor Deposition
- Chemical Vapor-Deposited Amorphous Silicon Nitride