Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-10-15

著者

• Ishii Tetsuyoshi

  Ntt Basic Research Laboratories

• TAMAMURA Toshiaki

  NTT Basic Research Laboratories

• Shigehara Kiyotaka

  Department Of Applied Chemistry Faculty Of Engineering Tokyo University Of Agriculture And Technolog

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• Direct Nanomolding of Semiconductor Single Crystals
• Photonic Crystal Using Anodic Porous Alumina
• Contrast Enhancement of ZEP520 Resist by Fullerene-Derivative Incorporation : Instrumentation, Measurement, and Fabrication Technology
• Fullerene-Derivative Nanocomposite Resist for Nanometer Pattern Fabrication
• Characterizations of Liquid Crystal Alignment on Poly-Diisopropyl Fumarate Langmuir-Blodgett Films
• The synthesis and luminescence quenching of the water-soluble polymer-supported tris(2,2'-bipyridine)ruthenium(II) analogue.
• The interaction of the tris(2,2'-bipyridine)ruthenium(II) ion with poly(p-styrenesulfonate).

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