Contrast Enhancement of ZEP520 Resist by Fullerene-Derivative Incorporation : Instrumentation, Measurement, and Fabrication Technology

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概要

• 論文の詳細を見る

• A fullerene-derivative nanocomposite resist system based on a positive-type electron-beam resist, ZEP520, is examined for contrast enhancement. The system containing 10wt% of the derivative shows a substantially enhanced γ-value of 22.9, which is about three-and-a-half times higher than that of a virgin ZEP resist, and exhibits a very-high-contrast 50nm pattern in an ultrathin film of 150nm. Etching resistance is also enhanced and the derivative seems to be as effective as C_<60>m terms of the number of molecules incorporated. The contrast enhancement by fullerene-derivative incorporation has the potential to further improve the resolution of ZEP and will extend its application in nanolithography.

• 社団法人応用物理学会の論文
• 2001-05-01

著者

• Murata Yuka

  Department Of Diagnostic Radiology Graduate School Of Medical Sciences Kumamoto University

• Ishii T

  Ntt Photonics Laboratories

• Ishii Tetsuyoshi

  Ntt Photonics Laboratories Ntt Corporation

• Shigehara Kiyotaka

  Department Of Applied Chemistry Faculty Of Engineering Tokyo University Of Agriculture And Technolog

• Shigehara Kiyotaka

  Department Of Applied Chemistry Faculty Of Engineering Tokyo University Of Agriculture And Technolog

• MURATAI Yuka

  Department of Applied Chemistry, Faculty of Engineering, Tokyo University of Agriculture and Technol

• Muratai Yuka

  Department Of Applied Chemistry Faculty Of Engineering Tokyo University Of Agriculture And Technolog

• Murata Yuka

  Department of Applied Chemistry, Faculty of Engineering, Tokyo University of Agriculture and Technology

• Ishii Tetsuyoshi

  NTT Photonics Laboratories

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