Negative Bias Temperature Instability on Plasma-Nitrided Si]icon Dioxide Film : Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-03-15
著者
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Cho Byung-jin
Department Of Electrical Engineering The National University Of Singapore
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Cho B‐j
Deptartment Of Electrical And Computer Engineering. National University Of Singapore
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Ang C‐h
Department Of Technology Development Chartered Semiconductor Manufacturing Ltd.
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Ang Chew-hoe
Department Of Electrical Engineering The National University Of Singapore
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Cho Byung-jin
Deptartment Of Electrical And Computer Engineering. National University Of Singapore
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Tan Shyue-seng
Department Of Electrical & Electronics Engineering. Nanyang Technological University
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LEK Chun-Meng
Deptartment of Electrical and Computer Engineering. National University of Singapore
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CHEN Tupei
Department of Electrical & Electronics Engineering. Nanyang Technological University
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LIN Wenhe
Department of Technology Development, Chartered Semiconductor Manufacturing Ltd.
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ZHEN Jia-Zheng
Department of Technology Development, Chartered Semiconductor Manufacturing Ltd.
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Zhen Jia-zheng
Department Of Technology Development Chartered Semiconductor Manufacturing Ltd.
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Lin Wenhe
Department Of Technology Development Chartered Semiconductor Manufacturing Ltd.
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Chen T
Department Of Electrical & Electronics Engineering. Nanyang Technological University
関連論文
- Negative Bias Temperature Instability on Plasma-Nitrided Si]icon Dioxide Film : Semiconductors
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