Coercivity Mechanism and Microstructure Study of Sputtered Nd-Fe-B/XA/Si(111) (X = W, PI) Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-10-15
著者
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CHIN Tsung-Shune
Department of Materials Science and Engineering, Tsing-Hut University
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Chen S‐k
Feng‐chia Univ. Taichung Twn
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Chen Shi-kun
Department Of Materials Science Feng-chia University
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Chen Shi-kun
Department Of Materials Science Feng Chia University
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Chin Tsung-shune
Department Of Materials Science & Engineering Tsing Hua University
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Chin T‐s
National Tsing Hua Univ. Taiwan Twn
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Tsai Jai-Lin
Department of Materials Science and Engineering, National Tsing Hua University
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Tsai J‐l
National Tsing Hua Univ. Hsinchu Twn
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Tsai Jai-lin
Department Of Electronics Engineering National Thing Hua University
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- Effect of Al on Bulk Amorphization and Magnetic Properties of FeSnPSiB Alloys
- Effect of Grain Curvature on Nano-Indentation Measurements of Thin Films
- Properties of VO_2 Films Sputter-Deposited from V_2O_5 Target
- Coercivity Mechanism and Microstructure Study of Sputtered Nd-Fe-B/XA/Si(111) (X = W, PI) Films
- Magnetic Properties and Growth Behavior of Nd-Fe-B Films on Si(111)
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- Effect of Grain Curvature on Nano-Indentation Measurements of Thin Films
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