Preparation of SrTiO_3 Films on 8-Inch Wafers by Chemical Vapor Deposition

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概要

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• SrTiO_3 films were grown on 8-inch-diameter Si substrates by chemical vapor deposition [CVD] using bis(dipivaloylmethanato) strontium [Sr(DPM_)2], titanium tetraisopropoxide [Ti(OiPr)_4)] and O_2. We have developed an oil-circulating showerhead-type nozzle to prevent condensation and decomposition of source materials. Conditions of supplying Sr(DPM)_2 were investigated with respect to cylinder pressure and the charge in the cylinder, using a simple vapor transport system. The deposition rate of SrTiO_3 films on 8-inch wafers was improved, to 2nm/min by increasing the charge in the source cylinder and decreasing the cylinder pressure. A thickness uniformity of 3.4% and a composition uniformity of 4.6% were obtained by complete mixing of gases. A step coverage of 85% was obtained using Sr(DPM)_2, titanyl bis(dipivaloylmethanako) [TiO(DPM)_2] and N_2O.

• 社団法人応用物理学会の論文
• 1996-09-30

著者

• KOBAYASHI Ichizo

  Tsukuba Laboratory, Nippon Sanso Corporation

• Arai Tsuyama

  Tsukuba Laboratories Nippon Sanso Corporation

• Sawado Yoshinori

  Tsukuba Laboratories Nippon Sanso Corporation

• INAISHI Yoshiaki

  Tsukuba Laboratories, Nippon Sanso Corporation

• HIDAKA Junichi

  Tsukuba Laboratories, Nippon Sanso Corporation

• Inaishi Yoshiaki

  Tsukuba Laboratories Nippon Sanso Corporation

• Hidaka Junichi

  Tsukuba Laboratories Nippon Sanso Corporation

• Kobayashi Ichizo

  Tsukuba Laboratories Nippon Sanso Corporation

• Tsuyama Arai

  Tsukuba Laboratories, Nippon Sanso Corporation

関連論文

• Synthesis of Ti(DPM)_2(OCH_3)_2 and Evaluation of the TiO_2 Films Prepared by Metal-Organic Chemical Vapor Deposition
• Preparation of SrTiO_3 Films on 8-Inch Wafers by Chemical Vapor Deposition
• Effect of Substrate Temperature on Electrical Characteristics of (Pb, La)(Zr, Ti)O_3 Ultrathin Films Deposited by Metalorganic Chemical Vapor Deposition
• Preparation of Pb(Zr, Ti)O_3 Thin Films Using All Dipivaloylmethane Source Materials by Metalorganic Chemical Vapor Deposition
• RuO_2 Bottom Electrodes for Ferroelectric (Pb, La)(Zr, Ti) O_3 Thin Films by Metalorganic Chemical Vapor Deposition

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