Fabrication of an Integrated Silicon-Based Lens for Low-Energy Miniaturized Electron Columns
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概要
- 論文の詳細を見る
A new process for the microfabrication of a fully integrated electrostatic lens in silicon, in particular the design of a low-energy miniaturized electron column, is described. It is suitable for batch processing and reduces considerably the difficulties associated with lens assembly. The electrode-spacer-electrode stack comprises an epitaxial p-n-p doped layer structure in silicon, which serves as electrodes and spacers, respectively. Because this technique allows the dimensions of the lens to be reduced, and owing to a new technique to align the electrode bores, the aberration of the lens is expected to be lower than that of lenses fabricated with previously reported techniques.
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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De Rooij
Institute Of Microtechnology University Of Neuchatel
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Staufer U
Univ. Neuchatel Neuchatel Che
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Staufer Urs
Ibm Research Division Zurich Research Laboratory:institute Of Physics University Of Basel:institute
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Vettiger Peter
Ibm Research Division Zurich Research Laboratory
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DESPONT Michel
IBM Research Division, Zurich Research Laboratory
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BELJAKOVIC Gilles
IBM Research Division, Zurich Research Laboratory
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STEBLER Camille
IBM Research Division, Zurich Research Laboratory
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Despont Michel
Ibm Research Division Zurich Research Laboratory:institute Of Physics University Of Basel:institute
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Stebler Camille
Ibm Research Division Zurich Research Laboratory:institute Of Physics University Of Basel
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Beljakovic Gilles
Ibm Research Division Zurich Research Laboratory:institute Of Microtechnology University Of Neuchate
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