Analysis of Substrate Effect in Chemically Amplified Resist on Silicate-Glass
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-12-30
著者
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SATO Yuichi
Central Research Laboratories, Sharp Corporation
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FUKUSHIMA Takashi
Central Research Laboratories, SHARP Corporation
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Fukushima Takashi
Central Research Laboratories Sharp Corporation
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Mori Shigeyasu
Central Research Laboratories Sharp Corporation:(present Address) Association Of Super-advanced Elec
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Sato Yuichi
Central Research Laboratories Sharp Corporation
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- Advanced Trench and Local Oxidation of Silicon (LOCOS) Isolation Technology for Ultra-Low-Power Bulk Dynamic Threshold Metal Oxide Semiconductor Field Effect Transistor (B-DTMOS)
- Analysis of Substrate Effect in Chemically Amplified Resist on Silicate-Glass
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