Fabrication Technique of High Density Quantum-Wire Arrays by Photolithography and Metalorganic Chemical Vapor Deposition

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概要

• 論文の詳細を見る

• We have fabricated GaAs quantum-wire arrays by using photolithography and metalorganic chemical vapor deposition (MOCVD). Multiple quantum-wire structures with lateral dimensions less than 200Å×1200Å have been obtained. An area filing factor greater than 50% can be achieved.

• 社団法人応用物理学会の論文
• 1991-12-15

著者

• YANG S.

  Department of Biomedical Engineering, University of Iowa

• Chen J.

  Varian Research Center

• BARONE R.

  Department of Electrical and Computer Engineering, State University of New York at Buffalo

• LIU P.

  Department of Electrical and Computer Engineering, State University of New York at Buffalo

• Barone R.

  Department Of Electrical And Computer Engineering State University Of New York At Buffalo

• Yang S.

  Department Of Electrical And Computer Engineering State University Of New York At Buffalo

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