Observation of the Surface and Structure of Very Thin Ti Film

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概要

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• Ti was deposited onto pyrex glass at room temperature under high vacuum pressure such as 5×10^<-10> torr; then film structures were observed with TEM and AES. It was found that at the early stage of deposition, the main component of the thin layer, whose thickness was up to about 80 Å, was TiO. However, in the thicker layer, the amount of TiO decreased, and the main component became Ti. Deposited Ti film formed an island state whose thickness was up to about 70 Å, and micro-crystallization began when the film reached about 400 Å at room temperature.

• 社団法人応用物理学会の論文
• 1990-02-20

著者

• Iida Shoji

  Department Of Electronics Osaka Sangyo University

• Iida Shoji

  Department Of Electrical Engineering And Electronics Osaka Sangyo University

関連論文

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