Wetting Failure of Photoresist on Spin-On-Glass (SOG) Substrate by Spin Coating

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-09-15

著者

• Nagata Hitoshi

  Ulsi Laboratory Mitsubishi Electric Corporation

• KAWAI Akira

  ULSI Laboratory, Mitsubishi Electric Corporation

• Kawai Akira

  Ulsi Laboratory Mitsubishi Electric Corporation:(present Address)department Of Electrical Engineerig

• Kawai Akira

  Ulsi Laboratory Mitsubishi Electric Corporation:(present Address) Department Of Electrical Engineeri

関連論文

• Wetting Behavior of Liquid on Geometrical Rough Surface Formed by Photolithography
• Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
• Blister Formation at Photoresist-Substrate Interface
• Local Peeling of Photoresist Film during Ultraviolet Light Exposure
• Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
• Proposal of a Next-Generation Super Resolution Technique
• Wetting Failure of Photoresist on Spin-On-Glass (SOG) Substrate by Spin Coating
• Characterization of Thin-Film Interference Effect due to Surface Roughness
• Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning (Special Issue on Scientific ULSI Manufacturing Technology)

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