Wetting Behavior of Liquid on Geometrical Rough Surface Formed by Photolithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-09-01
著者
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Nagata Hitoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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KAWAI Akira
ULSI Laboratory, Mitsubishi Electric Corporation
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Kawai Akira
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address) Department Of Electrical Engineeri
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Kawai Akira
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address) Department Of Electrical Engineeri
関連論文
- Wetting Behavior of Liquid on Geometrical Rough Surface Formed by Photolithography
- Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
- Blister Formation at Photoresist-Substrate Interface
- Local Peeling of Photoresist Film during Ultraviolet Light Exposure
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
- Proposal of a Next-Generation Super Resolution Technique
- Wetting Failure of Photoresist on Spin-On-Glass (SOG) Substrate by Spin Coating
- Characterization of Thin-Film Interference Effect due to Surface Roughness
- Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning (Special Issue on Scientific ULSI Manufacturing Technology)