Preparation of High Remanence TbFe Films
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概要
- 論文の詳細を見る
The remanence of amorphous TbFe films with perpendicular anisotropy deposited by several deposition methods was investigated. The uniaxial anisotropy was enhanced in films deposited onto rotating substrates. The coercivity increased with dual gun sputtering compared to single gun sputtering. The remanence did not depend on the anisotropy directly but was mainly related to the wall coercivity. In dual gun rf magnetron sputter-deposited films onto rotating substrates, the wall coercivity was so large that magnetization rotation dominated the magnetization reversal, resulting in high remanence. The wall coercivity also increased in laminated films. A high remanence of 300 Gs with a residual ratio of 1 has been obtained in Tb_<31>Fe_<69> films produced with a repetition of the deposition of a 0.5 μm thick lamina and the time intervals between the sputtering of each lamina.
- 社団法人応用物理学会の論文
- 1987-08-20
著者
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Inokuchi S
Department Of Control Engineering Faculty Of Engineering Science Osaka University
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Inokuchi S
Takarazuka University Of Art And Design
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Inokuchi Seiji
Department Of Control Engineering Faculty Of Engineering Science Osaka University
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Higashi Isao
Department Of Control Engineering Faculty Of Engineering Science Osaka University:(present Address)
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Sakurai Y
Shonan Inst. Technol. Kanagawa Jpn
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Sakurai Yoshifumi
Department Of Control Engineering Faculty Of Engineering Science Osaka University
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NUMATA Takuhisa
Department of Control Engineering, Faculty of Engineering Science, Osaka University
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Numata T
Hirosaki Univ. Aomori Jpn
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Numata Takuhisa
Department Of Control Engineering Faculty Of Engineering Science Osaka University
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Sakurai Yoshifumi
Department Of 2nd Surg. Niigata City Hospital
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