Noncontact Measurement of Film Thickness by the Photothermal Deflection Method
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概要
- 論文の詳細を見る
A noncontact film-thickness measurement method using photothermal deflection was studied from theoretical and experimental results of the film-thickness dependency of the deflection amplitude. The calculated results showed that thicknesses in a range from the skin depth to the thermal-diffusion length of an opaque film could be determined from the deflection amplitude, which increased monotonously in that range. It was shown that the thicknesses of a transparent film could be determined from the vibrational structure of the deflection amplitude due to an interference effect of the excitation beam or from its decrease by an adiabatic effect of the film. Experimental results for NiO films (3-38 μm) and SiO_2 films (20-110 nm) revealed the possibility of noncontact film-thickness measurements in air and water.
- 社団法人応用物理学会の論文
- 1987-10-20
著者
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Uchida S
Tohoku Univ. Sendai
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Uchida Shunsuke
Department Of Quantum Science And Energy Engineering Graduate School Of Engineering Tohoku Universit
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Uchida Shunsuke
Energy Research Laboratory Hitachi Ltd.
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SUZUKI Kazumichi
Energy Research Laboratory, Hitachi Ltd.
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Fujimori Haruo
Energy Research Laboratory Hitachi Ltd.
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Fujimori Haruo
Energy Research Laboratory Hitachi Lid.
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Asakura Yamato
Energy Research Laboratory Hitachi Ltd.
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Suzuki Kazumichi
Energy Research Laboratory Hitachi Ltd.
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