Characterization of WN_x/GaAs Schottky Contacts Formed by Reactive RF Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-01-20
著者
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Yamagishi Haruo
Microwave Solid-state Department Komukai Works Toshiba Corporation
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Yamagishi Haruo
Microwave Solid-state Department Toshiba Corporation
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Yamagishi Haruo
Microwave Solid-state Department Komukai Workd Toshiba Corporation
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YAMAMOTO Yasuhiro
Research Center of Ion Beam Technology, Hosei University
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Yamamoto Yasuhiro
Research Center Of Ion Beam Technology Hosei University
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Yamamoto Yasuhiro
Research Center For Advanced Science And Technology University Of Tokyo
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