Characteristics of Nb Thin-Film Point-Contact Josephson Junctions
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概要
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This paper describes some niobium thin-film point-contact Josephson junctions fabricated by magnetron sputtering and electron-beam lithography. The microwave-induced I-V step characteristics of a junction was expanded at a level of 1.9 mV, showing a step flatness of better than 1 ppm (2 nV) over a current span of 70 μA-the first time such flatness has been observed in thin-film weak links. The junctions are stable and withstand thermal cycling. The distribution of the critical current (I_c) and normal resistance (R_n) at 4.2 K is reported for 32 samples. The temperature dependence of the I_c R_n product was found to agree with the recent Kulik-Omelyanchuk theory of weak links, but some samples had I_c R_n products greater than those predicted by weak link theories.
- 社団法人応用物理学会の論文
- 1984-05-20
著者
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Naito Shinya
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Naito S
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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NAITO Seiichi
Yokogawa Electric Corporation
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Naito Seiichi
Yokogawa Hokushin Electric Corporation
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Higashino Yasushi
Yokogawa Hokushin Electric Corporation
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Higashino Yasushi
Yokogawa Electric Corporation
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