A New Microbridge with an Improved I-V Curve
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概要
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The I-V curves of microbridges of uniform thickness and given geometry are calculated, and the results are in good agreement with those of Pb thin-film microbridges with the corresponding geometries. Using this result, we have designed a microbridge of new geometry with metallic balls at the edges of the bridge part which prevent the normal state from expanding into the electrodes when the electric current is increased. A very simple technique for fabricating this new microbridge is described. With the new microbridge, more Shappiro steps have been observed than with conventional microbridges, up to a voltage as high as 0.7 mV.
- 社団法人応用物理学会の論文
- 1983-02-20
著者
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Musha Toshimitsu
Department Of Applied Electronics Tokyo Institute Of Technology
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KOBAYASHI Masanori
Department of Pediatrics, University of Nagoya
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Kobayashi Masanori
Department Of Applied Electronics Tokyo Institute Of Technology
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