Development of CH_4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-05-15
著者
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Inaba Hiroshi
Production Engineering Research Laboratory Hitachi Ltd.
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Kataoka H
Data Storage And Retrieval Systems Division Hitachi Ltd.
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KOKAKU Yuuichi
Data Storage and Retrieval Systems Division, Hitachi, Ltd.
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TERAKADO Masatomo
Data Storage and Retrieval Systems Division, Hitachi, Ltd.
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KATAOKA Hiroyuki
Data Storage and Retrieval Systems Division, Hitachi, Ltd.
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Kokaku Yuuichi
Data Storage And Retrieval Systems Division Hitachi Ltd.
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Terakado Masatomo
Graduate School Of Science And Technology Niigata University
関連論文
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- Light Emission Property from Organic Dye Thin Films due to Excitation of Multiple Surface Plasmons
- Properties of Diamond-Like Carbon FilmsFabricated by the Filtered Cathodic Vacuum Arc Method
- Structural Study of Ultrathin Hydrogenated Amorphous Carbon Films Using Spectroscopic Ellipsometry and Ultraviolet Raman Spectroscopy
- Control of Plasma Parameters for High-Quality Hydrogenated Amorphous Carbon Growth
- Parameter Insensitive Disturbance-Rejection Problem with Incomplete-State Feedback
- A State Space Approach for Distributed Parameter Circuit : Disturbance-Rejection Problem for Infinite-Dimensional Systems (Special Section on Signal Processing and System Theory)
- Influence of Substrates on Initial Growth of Diamond-Like Carbon Films
- Development of CH_4-Radio-Frequency-Plasma-Enhanced Chemical Vapor Deposition Method with a Positively Self-Biased Electrode for Diamond-Like Carbon Film
- Tetrahedral Amorphous Carbon Films By Filtered Cathodic Vacuum-Arc Deposition For Air-Bearing-Surface Overcoat
- Structural Study of Ultrathin Hydrogenated Amorphous Carbon Films Using Spectroscopic Ellipsometry and Ultraviolet Raman Spectroscopy