In_<0.52>Al_<0.48>AS/In_xGa_<1-x>As (0.53<x<1.0) Pseudomorphic High Electron Mobility Transistors with High Breakdown Voltages : Design and Performances
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-01-15
著者
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Maile B
Xlith Gmbh Illerrieden Deu
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Berg M
Daimler‐benz Ag Ulm Deu
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Schurr Anton
Daimler-benz Research Center Ulm
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DICKMANN Jurgen
Daimler-Benz Research Center Ulm
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RIEPE Klaus
Daimler-Benz Research Center Ulm
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GEYER Arthur
Daimler-Benz Research Center Ulm
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MAILE Bernd
Daimler-Benz Research Center Ulm
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SUHURR Anton
Daimler-Benz Research Center Ulm
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BERG Michael
Daimler-Benz Research Center Ulm
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DAEMBKES Heinrich
Daimler-Benz Research Center Ulm
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Berg Michael
Daimler-benz Ag Research Center Ulm
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Dickmann J
Daimler‐benz Ag Ulm Deu
関連論文
- In_Al_AS/In_xGa_As (0.53
- Breakdown Mechanisms in Pseudomorphic InAlAs/In_xGa_As High Electron Mobility Transistors on InP. II : On-State
- Breakdown Mechanisms in Pseudomorphic InAlAs/In_xGa_As High Electron Mobility Transistors on InP. I: Off-State
- Low-Power Consumption InGaAs PIN Diode Switches for V-band Applications
- Analytical Model to Determine the Gate Leakage Current in In_Al_AS/In_xGa_As Pseudomorphic Modulation Doped Field-Effect Transistors Caused by Thermionic Field Emission
- The Backside Pulse Doped Channel Heterostructure Field-Effect Transistor: Design, DC, and RF Performance