Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution (<Special Issue> Plasma Processing)

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-07-30

著者

• ICHIHARA Katsutaro

  Materials and Devices Labs, R&D Center, Toshiba Corp.

• Ichihara Katsutaro

  Materials And Devices Laboratories Toshiba Research And Development Center

• OKUBO Michiko

  Materials and Devices Laboratories, Toshiba Research and Development Center

• Okubo Michiko

  Materials And Devices Laboratories Toshiba Research And Development Center

関連論文

• Super-Resolution Effect of Semiconductor-Doped Glass
• Optical Properties of Au-SiO_2 Composite Films : a Possible Candidate as an Element in Phase-Change Optical Media
• Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution ( Plasma Processing)
• Reactive Ion Etching of Co-Zr-Nb Thin Film Using BCl_3
• Reactive Ion Etching of Co–Zr–Nb Thin Film Using BCl3

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