ICHIHARA Katsutaro | Materials and Devices Labs, R&D Center, Toshiba Corp.
スポンサーリンク
概要
関連著者
-
ICHIHARA Katsutaro
Materials and Devices Labs, R&D Center, Toshiba Corp.
-
Ichihara Katsutaro
Materials And Devices Laboratories Toshiba Research And Development Center
-
Nagase Toshihiko
Department Of Microbiology And Second Department Of Hygienic Chemistry Tohoku College Of Pharmacy
-
Ashida Sumio
Storage Materials And Devices Lab. Corporate Research And Development Center Toshiba Corporation
-
Ashida Sumio
Materials And Devices Research Laboratories Toshiba Corp.
-
Nagase Toshihiko
Marine Resources And Environment Institute National Institute Of Advanced Industrial Science And Tec
-
NAGASE Toshihiko
Materials and Devices Labs, R&D Center, Toshiba Corp.
-
Ichihara Katsutaro
Storage Materials And Devices Lab. Corporate Research And Development Center Toshiba Corporation
-
Nagase Toshihiko
Materials and Devices Labs, R&D Center, Toshiba Corp., 1,
-
Ashida Sumio
Materials and Devices Labs, R&D Center, Toshiba Corp., 1,
-
Nakamura N
Optical Disc Development Department Core Technology Center Digital Media Network Company Toshiba Cor
-
NAKAMURA Naomasa
Multimedia Eng. Laboratory, Toshiba Corp.
-
Hara Michiko
Materials And Devices Labs. Research And Development Center Toshiba Corp.
-
Kikitsu A
Materials And Devices Labs. R&d Center Toshiba Corp.
-
KIKITSU Akira
Materials and Devices Labs., R&D Center, Toshiba Corp.
-
Ichihara Katsutaro
Materials And Devices Labs. Research And Development Center Toshiba Corp.
-
OKUBO Michiko
Materials and Devices Laboratories, Toshiba Research and Development Center
-
Okubo Michiko
Materials And Devices Laboratories Toshiba Research And Development Center
-
Kikitsu Akira
Materials and Devices Labs., R&D Center, Toshiba Corp.
著作論文
- Super-Resolution Effect of Semiconductor-Doped Glass
- Optical Properties of Au-SiO_2 Composite Films : a Possible Candidate as an Element in Phase-Change Optical Media
- Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution ( Plasma Processing)
- Reactive Ion Etching of Co-Zr-Nb Thin Film Using BCl_3