Reactive Ion Etching of Co-Zr-Nb Thin Film Using BCl_3

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Hara Michiko

  Materials And Devices Labs. Research And Development Center Toshiba Corp.

• ICHIHARA Katsutaro

  Materials and Devices Labs, R&D Center, Toshiba Corp.

• Ichihara Katsutaro

  Materials And Devices Labs. Research And Development Center Toshiba Corp.

関連論文

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• Optical Properties of Au-SiO_2 Composite Films : a Possible Candidate as an Element in Phase-Change Optical Media
• Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution ( Plasma Processing)
• Reactive Ion Etching of Co-Zr-Nb Thin Film Using BCl_3
• Reactive Ion Etching of Co–Zr–Nb Thin Film Using BCl3

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