OKUBO Michiko | Materials and Devices Laboratories, Toshiba Research and Development Center

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概要

• 同名の論文著者
• Materials and Devices Laboratories, Toshiba Research and Development Centerの論文著者

関連著者

• ICHIHARA Katsutaro

  Materials and Devices Labs, R&D Center, Toshiba Corp.

• Ichihara Katsutaro

  Materials And Devices Laboratories Toshiba Research And Development Center

• OKUBO Michiko

  Materials and Devices Laboratories, Toshiba Research and Development Center

• Okubo Michiko

  Materials And Devices Laboratories Toshiba Research And Development Center

著作論文

• Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution ( Plasma Processing)

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