Fabrication of Self-Aligned Aluminum Gate Polysilicon Thin-Film Transistors Using Low-Temperature Crystallization Process
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-30
著者
-
Morita Toshihiro
Department Of Electrical And Electronics Engineering Sophia University
-
Itoh Masataka
Central Research Laboratories Sharp Corporation
-
YOSHINOUCHI Atsushi
Central Research Laboratories, SHARP Corporation
-
MORITA Tatsuo
Central Research Laboratories, SHARP Corporation
-
TSUCHIMOTO Shuhei
Central Research Laboratories, SHARP Corporation
-
OHNO Eizo
Central Research Laboratories, Sharp Corporation
-
HOSODA Takeshi
Central Research Laboratories, Sharp Corporation
-
Morita T
Hitachi Ltd. Ibaraki Jpn
-
Ohno Eizo
Central Research Laboratories Sharp Corporation
-
Tsuchimoto S
Central Research Laboratories Sharp Corporation
-
Tsuchimoto Shuhei
Central Research Laboratories Sharp Corporation
-
Hosoda Takeshi
Central Research Laboratories Sharp Corporation
-
Yoshinouchi Atsushi
Central Research Laboratories Sharp Corporation
関連論文
- Absorption Coefficient Measurements of MgZnCdSe II-VI Compounds on InP Substrates and Quantum Confined Stark Effect in ZnCdSe/MgZnCdSe Multiple Quantum Wells
- Absorption Coefficient Measurements of MgZnCdSe II-VI Compounds on InP Substrates and Quantum Confined Stark Effect in ZnCdSe/MgZnCdSe Multiple Quantum Wells
- Formation of Sources/Drains Using Self-Activation Technique on Polysilicon Thin Film Transistors
- Fabrication of Self-Aligned Aluminum Gate Polysilicon Thin-Film Transistors Using Low-Temperature Crystallization Process
- Magnetic Field Dependence of Voltage Noise in Y_1Ba_2Cu_3O_ Ceramic Superconductor Film
- Galvanomagnetic Effect of an Y-Ba-Cu-O Ceramic Superconductor and Its Application to Magnetic Sensors : Electrical Properties of Condensed Matter
- 4-2 Compressor with Complementary Pass-Transistor Logic
- A Proposal of New Multiple-Valued Mask-ROM Design
- In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition ( Plasma Processing)