Current-Voltage Characteristics of a-Si:H Film Photodiodes Prepared by Mercury-Sensitized Photochemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-09-15
著者
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Nozaki H
Toshiba Corp. Kawasaki Jpn
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NIIYAMA Takako
Research & Development Center, Toshiba Corporation
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NOZAKI Hidetoshi
Research & Development Center, Toshiba Corporation
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Niiyama Takako
Research & Development Center Toshiba Corporation
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