High-Density and High-Carrier-to-Noise-Ratio Optical Disk Mastering
スポンサーリンク
概要
- 論文の詳細を見る
A scanning tunneling microscope (STM) was used to observe the surface profile of an optical disk and to quantitatively evaluate the lithography conditions in the mastering process. A high-density and high-carrier-to-noise-ratio (C/N) optical disk was achieved using precise data concerned with the relations among the mastering process, the profile of the masters, and the readout signal.
- 社団法人応用物理学会の論文
- 1992-02-28
著者
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Murakami Teruo
Research And Development Center Toshiba Corporation
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Nakano T
National Inst. Advanced Interdisciplinary Res. Ibaraki Jpn
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Murakami T
Hiroshima Univ. School Of Medicine Hiroshima Jpn
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TAIRA Kouzoh
Research and Development Center, Toshiba Corporation
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Taira Kouzoh
Research And Development Center Toshiba Corporation
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NAKANO Toshiyuki
Research and Development Center, Toshiba Corporation
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TAIRA Kozo
Research and Development Center, Toshiba Corporation
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MATSUMARU Masaaki
Research and Development Center, Toshiba Corporation
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Matsumaru Masaaki
Research And Development Center Toshiba Corporation
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