Investigation of Reoxidation and Phosphorus Behavior in HF-Treated Heavily Doped Silicon Surfaces
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-11-15
著者
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KAMIURA Yoshitomo
College of Integrated Arts and Sciences, University of Osaka Prefecture
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Kamiura Yoshitomo
College Of Integrated Arts And Sciences University Of Osaka Prefecture
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MIZOKAWA Yusuke
College of Integrated General Arts and Sciences, University of Osaka Prefecture
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Mizokawa Y
College Of Integrated Arts And Sciences University Of Osaka Prefecture
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Mizokawa Yusuke
College Of Integrated General Arts And Sciences University Of Osaka Prefecture
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Isobe Yoshihiko
Nippondenso Co. Ltd.
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IIDA Makio
Nippondenso Co., Ltd.
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KAWAMOTO Kazunori
Nippondenso Co., Ltd.
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Iida Makio
Nippondenso Co. Ltd.
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Kawamoto K
Hitachi Ltd. Yokohama Jpn
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MIZOKAWA Yusuke
College of Integrated Arts and Sciences, University of Osaka Prefecture
関連論文
- Spectroscopic Study of Rapid Mixing and Cooling of a High-Density He Plasma Flow Penetrating into Hydrogen Gas
- XPS Study on Oxide/GaSb Interfacial Chemical Reaction at Room Temperature
- XPS Study of Gd-Co and Gd-Fe Amorphous Films
- A Consideration of the Chemical Shift in ESCA Spectra from Oxide/Semiconductor Interface
- Effects of Water Vapor and Oxygen Excitation on Oxidation of GaAs, GaP and InSb Surfaces Studied by X-Ray Photoemission Spectroscopy
- An XPS Analysis of Thermally Grown Oxide Film on GaP
- X-Ray Photoemission Study of the Interaction of Oxygen and Air with Cleaved GaAs (110) Surfaces
- Investigation of Reoxidation and Phosphorus Behavior in HF-Treated Heavily Doped Silicon Surfaces
- AES Study of the Reaction between a Thin Fe-Film and $\beta$-SiC (100) Surface
- AES Study of the Reaction between a Thick Fe-Film and $\beta$-SiC (100) Surface