Spectroscopic Ellipsometry of Thin Copper Films on Glass Substrates
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概要
- 論文の詳細を見る
The complex reflectance ratio, ρ=R_p/R_s, for p- and s-polarized lights of copper island films with the mean mass thickness d_w of 4 to 16 nm on glass substrates was measured in the visible region by means of in-situ ellipsometry. The observed wavelength dependence of ρ was interpreted with the effective anisotropic continuous film model. The clear resonance peak of plasma oscillation in ε"_x was observed at E≃1.8 eV, which corresponded to the mean distance between the particles of 7.5 nm in the film of d_w=4 nm. The estimated particle radius r was smaller by a factor of 10^<-1> or 10^<-2> than the island size directly observed by means of a scanning electron microscope.
- 社団法人応用物理学会の論文
- 1993-05-15
著者
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MIZOGUCHI Tadashi
Faculty of Pharmaceutical Sciences, Osaka University
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Kawagoe Takeshi
Faculty Of Science Gakushuin University
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