Continuous Ellipsometric Determination of the Optical Constants and Thickness of a Silver Film during Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1969-05-05

著者

• YOSHIDA Sadafumi

  Department of Electrical and Electronic Systems, Saitama University

• Yoshida Sadafumi

  Department Of Applied Physics Faculty Of Engineering University Of Tokyo

• Yamaguchi Tomuo

  Department Of Applied Physics Faculty Of Engineering University Of Tokyo

• KINBARA Akira

  Department of Applied Physics, Univeresity of Tokyo

• Kinbara Akira

  Department Of Applied Physics Faculty Of Engineering The University Of Tokyo

関連論文

• Measurements of the Depth Profile of the Refractive Indices in Oxide Films on SiC by Spectroscopic Ellipsometry
• Characterization of Oxide Films on SiC by Spectroscopic Ellipsometry
• Thickness Measurements of Thin Gold Films by γ-ray Spectroscopy
• Continuous Ellipsometric Determination of the Optical Constants and Thickness of a Silver Film during Deposition
• Ultrasonic Pulse Echoes in Vacuum-Deposited Silver Films
• The Decay in Electrical Resistance in Evaporated Gold Films
• Internal Stress of Evaporated Thin Gold Films
• Non-Ohmic Property of thin Metal Films
• Variation of the Optical Properties of Iron at Transition Temperature
• Superstructures and Growth Properties of Indium Deposits on Silicon (111) Surfaces with Its Influence on Surface Electrical Conduction
• In situ Observation of Clusters in Gas Phase during 4H-SiC Epitaxial Growth by Chemical Vapor Deposition Method
• Optical Constants of Cubic GaN, AlN, and AlGaN Alloys
• Elongated shaped Si Island Formation on 3C-SiC by Chemical Vapor Deposition and Its Application to Antiphase Domain Observation
• In situ Observation of Clusters in Gas Phase during 4H-SiC Epitaxial Growth by Chemical Vapor Deposition Method
• Characterization of Carrier Concentration and Mobility in n-type SiC Wafers Using Infrared Reflectance Spectroscopy

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