X-Ray Analysis of Interface Layer in Ge-Si n-n Heterojunction
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1968-05-05
著者
-
Fujimoto Takeo
Faculty Of Engineering Science Osaka University
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Yamaguchi Jiro
Faculty Of Engineering Science Osaka University
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Yamaguchi Jiro
Faculty Of Engineering Kansai University
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