Effects of Aluminum Electrode and Hydrogen Gas during Heat Treatments on MOS Structure

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1966-09-15

著者

• Tokutaka Heizo

  Central Research Laboratory Matsushita Electric Industrial Co. Ltd.

• Kubo Shuji

  Central Research Laboratory Matsushita Electric Industrial Co. Ltd.

• AKIYAMA Kenji

  Central Research Laboratory Matsushita Electric Industrial Co., Ltd.

関連論文

• Effects of Heat Treatment on Thermally Oxidized Silicon
• The Influence of Dissolved Oxygen in SiO_2 on C-V Characteristics
• Investigation of Si-Ta_2O_5 System Prepared by Reactive Sputtering
• Thermal Stresses in an Infinite Circular Cylinder Exposed to Moving Heat Sources
• Effects of Aluminum Electrode and Hydrogen Gas during Heat Treatments on MOS Structure
• Magnetic Anisotropy in Single-Crystal Permalloy Thin Films Epitaxially Grown on LiF(110) Surface
• Growth of Crystalline Silicon Films on Polycrystalline Substrate

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