Investigation of Si-Ta_2O_5 System Prepared by Reactive Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1966-09-15
著者
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Takemoto Toyoki
Central Research Laboratory Matsushita Electric Industrial Co. Ltd.
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AKIYAMA Kenji
Central Research Laboratory Matsushita Electric Industrial Co., Ltd.
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ISHIHARA Takashi
Central Research Laboratory Matsushita Electric Industrial Co., Ltd.
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Ishihara Takashi
Central Research Laboratory Matsushita Electric Industrial Co. Ltd.
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Akiyama Kenji
Central Research Laboratory Matsushita Co. Ltd.
関連論文
- Effects of Heat Treatment on Thermally Oxidized Silicon
- Investigation of Si-Ta_2O_5 System Prepared by Reactive Sputtering
- Thermal Stresses in an Infinite Circular Cylinder Exposed to Moving Heat Sources
- Effects of Aluminum Electrode and Hydrogen Gas during Heat Treatments on MOS Structure
- Growth of Crystalline Silicon Films on Polycrystalline Substrate