Range Distribution of Implanted Arsenic in Silicon Dioxide

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1977-04-05

著者

• Horie Kazuo

  Lsi Development Laboratory Mitsubishi Electric Corporation

• Akasaka Youichi

  Lsi Development Laboratory Mitsubishi Electric Corporation

• TSUKAMOTO Katsuhiro

  LSI Development Laboratory, Mitsubishi Electric Corporation

• Tsukamoto Katsuhiro

  Lsi Development Laboratory Mitsubishi Electric Corporation

関連論文

• Range Distribution of Implanted Arsenic in Silicon Dioxide
• Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors : A-2: DEVICE TECHNOLOGY (II)
• Study of Tin Diffusion into Silicon by Backscattering Analysis
• Thermal Diffusion of Ion-Implanted Arsenic in Silicon

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