Implication of Contact Thermalization Effect in Two-Valley Semiconductors for the High Frequency Device Performance
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1973-02-05
著者
-
Toyabe Toru
Central Research Laboratory Hitachi Ltd.
-
Kodera Hiroshi
Central Research Laboratory Hitachi Ltd.
-
KODERA Hiroshi
Central Research Laboratory, Hitachi, Ltd.
関連論文
- A Method of Producing Heterojunctions between Compound Semiconductors by Alloying and Substitution Reaction
- A Theory for Intervalley Transfer Effect in Two-Valley Semiconductors
- Two-dimensional Analysis of Vertical Junction Gate FET's : A-4: FIELD EFFECT TRANSISTORS (I)
- Effect of Field-Dependent Carrier Diffusion on the Two-Dimensional Analysis of a Junction Gate FET
- Effect of Doping on the Electron Spin Resonance in Phosphorus Doped Silicon. : III. Absorption Intensity
- Implication of Contact Thermalization Effect in Two-Valley Semiconductors for the High Frequency Device Performance
- Diffusion of Impurities in the Semiconductor Melt III. : Experimental Determination of Thickness of the Solute Diffusion Layer in the Melting Process
- Diffusion of Impurities in the Semiconductor Melt II. : Dynamical Analysis of Impurity Redistribution in the Melting Process
- Constitutional Supercooling during the Crystal Growth of Germanium and Silicon
- Effect of Doping on the Electron Spin Resonanceain Phosphorus Doped Silicon Studied at Liquid Nitrogen Temperature
- Effect of Doping on the Electron Spin Resonance in Phosphorus Doped Silicon. : IV. Experimental Study at Liquid Helium Temperature
- Effect of Doping on the Electron Spin Resonance in Phosphorus Doped Silicon
- Precipitation of Antimony in Heavily Doped Silicon Identified by X-ray Microanalyzer
- Diffusion Coefficients of Impurities in Silicon Melt
- Dyson Effect in the Electron Spin Resonance of Phosphorus Doped Silicon
- Solid Solubility of Gold in Germanium