Simplified Expression for the Distribution of Diffused Impurity

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1971-01-05

著者

• Ohkawa Shinji

  Fujitsu Laboratories Ltd.

• Nakajima Yoshio

  Fujitsu Laboratories Ltd.

• FUKUKAWA Yukio

  Fujitsu Laboratories Ltd.

関連論文

• Current Limitation Induced by Infrared Light in n-Type GaAs Thin Layers on Semi-Insulating Cr-Doped GaAs
• Substrate Bias Effect on Ion-Implanted GaAs MESFETs
• The Effect of the Oxide Layer on the Diffusion of Ga in Si
• Effects of the Heating Rate in Alloying of An-Ge to n-Type GaAs on the Ohmic Properties
• Arsenic Diffusion into Silicon from Elemental Source
• Diffusion Profiles of Arsenic in Silicon Observed by Backscattering Method and by Electrical Measurement
• Simplified Expression for the Distribution of Diffused Impurity
• Atmosphere Effect on Migration of Co and Si in Au-Go-Si System
• The Anomalous Diffusion of Gallium in Silicon

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