Distribution of magnetic field and plasma diagnosis in facing targets sputtering apparatus

概要

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The distribution of the magnetic field and plasma diagnosis in the facing targets sputtering apparatus have been investigated and performed by using a gaussmeter and single probe method, respectively, and the field distribution was compared with calculated one by computer aided finite element method. Perpendicular line of force between target planes and extremely high magnetic field above target edge confined plasma almost perfectly and substrates could be placed in plasma-free region even for ferromagnetic targets. The measured radial field distribution at the central plane between two facing targets agreed well with calculated one. Parameters important for controlling distribution and strength of magnetic field in FTS system seemed to be distance between targets, target magnetism, performance of magnet and distance between target and magnet, in the order of influence degree. It was shown that the size of permanent magnets for confining plasma may influence the strength of magnetic field but may not do the distribution of magnetic flux.
社団法人映像情報メディア学会の論文
1993-11-11