Effect of hexamethyldisilazane on the electrical characteristics of a porous silica thin film
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概要
- 論文の詳細を見る
The effect of hexamethyldisilazane (HMDS) vapor treatment on the leakage current and capacitance of the porous silica thin film having periodic structure were investigated. The leakage current and dielectric constant of the film increased during measurement in the air due to moisture absorption. It is found that the HMDS treatment of the silica film could suppress the increase of leakage current and dielectric constant. The increase of leakage current and dielectric constant could be suppressed by approximately 1/100, and 1/10, respectively.
- 社団法人電子情報通信学会の論文
- 2002-06-24
著者
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Kikkawa T.
Research Center For Nanodevices And Systems Hiroshima University
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Kikkawa T.
Research Center For Nanodevices Hiroshima University
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Komura K.
Research Center For Nanodevices Hiroshima University
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Sakamoto S.
Research Center for Nanodevices, Hiroshima University
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