A Light-Shield a-Si TFT with Low Dark-Leakage Currents
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概要
- 論文の詳細を見る
A light-shield amorphous silicon (a-Si:H) thin film transistor (TFT) with low dark leakage current is developed. The a-Si:H island edge of this TFT is selectively oxidized without affecting the metal/n^+ a-Si:H layer contact quality, and thus the hole current flowing through the parasitic metal/intrinsic a-Si:H contact at that edge can be blocked. Using this technique, the TFT with effective mobility of 0.7 cm^2/Vsec, subthreshold swing of 0.55V/dec, and threshold voltage of 1.5 V can be achieved. In addition, the leakage current of the TFT is as low as 0.5 pA at high negative gate bias of -10V and drain voltage of 10V.
- 社団法人電子情報通信学会の論文
- 1999-03-18
著者
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Chen Y‐e
Electronic Research & Service Organization:industrial Technology Research Institute
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Chen Jr-Hong
Electronics Research and Service Organization
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Chen Yeong-e
Electronics Research And Service Organization Industrial Technology Research Institute
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Tai Ya-Hsiang
Electronic Research & Service Organization
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Tai Ya-hsiang
Electronic Research & Service Organization:industrial Technology Research Institute
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Chen Yeong-E
Electronic Research & Service Organization:Industrial Technology Research Institute
関連論文
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- Effect of deposition temperature of SiN_x/a-Si/n+a-Si films by monochamber PECVD processing on a-Si TFT electrical characteristics and stability
- Effect of Parasitic Resistance on Mobilily in Laser Crystallized LT poly-Si TFTs (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (TFT Technology for AM LCD)
- A Light-Shield a-Si TFT with Low Dark-Leakage Currents (第5回日韓台中情報ディスプレイ合同研究会(ASID '99))
- A Light-Shield a-Si TFT with Low Dark-Leakage Currents
- Study on the Pixel Voltage of TFTLCDs with Optical Measurement (第5回日韓台中情報ディスプレイ合同研究会(ASID '99))
- Study on the Pixel Voltage of TFTLCDs with Optical Measurement