TCAD-Yesterday, Today and Tomorrow (Special Issue on TCAD for Semiconductor Industries)
スポンサーリンク
概要
- 論文の詳細を見る
This paper outlines the modeling requirements of integrated circuit (IC) fabrication processes that have lead to and sustained the development of computer-aided design of technology (i.e. TCAD). Over a period spanning more than two decades the importance of TCAD modeling and the complexity of required models has grown steadily. The paper also illustrates typical applications where TCAD has been powerful and strategic to IC scaling of processes. Finally, the future issues of atomic-scale modeling and the need for an hierarchical approach to capture and use such detailed information at higher levels of simulation are discussed.
- 一般社団法人電子情報通信学会の論文
- 1999-06-25
著者
関連論文
- Analysis of Distortion Behavior Considering Polydepletion Effect in MOS Transistors
- Atomic-Scale and Hierarchical Modeling for Nano-Electronics
- Large Signal Analysis of RF Circuits in Device Simulation (Special Issue on TCAD for Semiconductor Industries)
- TCAD-Yesterday, Today and Tomorrow (Special Issue on TCAD for Semiconductor Industries)