Low-Temperature MBE Growth of a TlGaAs/GaAs Multiple Quantum-Well Structure(<Special Issue>Heterostructure Microelectronics with TWHM2003)
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概要
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A TlGaAs/GaAs multiple quantum-well (MQW) structure having four identical well layers was grown on a GaAs (001) substrate by low-temperature molecular-beam apitaxy (MBE) at 190℃. The (004) X-ray diffraction (XRD) curve of this sample showed satellite peaks up to the ±3rd order at least The measured XRD ct〜rve agreed well with the theoretically simulated one with a Tl content of x = 7% and a width of 57 Å for the Tl_xGa_<1-x>As wall layers. This result indicates that the grown MQW structure has good single-crystalline quality as well as flat arid sharp interfaces.
- 社団法人電子情報通信学会の論文
- 2003-10-01
著者
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NISHIMOTO Naoki
Department of Surgical Oncology, Research Institute for Radiation Biology and Medicine
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Kajikawa Yasutomo
Department Of Electric And Control Systems Engineering Interdisciplinary Faculty Of Science And Engi
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Kobayashi Nobuhiro
Department Of Electric And Control Systems Engineering Interdisciplinary Faculty Of Science And Engi
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KAWASAKI Naoyuki
Department of Electric and Control Systems Engineering, Interdisciplinary Faculty of Science and Eng
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HIGUCHI Yasuaki
Department of Electric and Control Systems Engineering, Interdisciplinary Faculty of Science and Eng
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Nishimoto Naoki
Department Of Electric And Control Systems Engineering Interdisciplinary Faculty Of Science And Engi
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Kawasaki Naoyuki
Department Of Electric And Control Systems Engineering Interdisciplinary Faculty Of Science And Engi
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Higuchi Yasuaki
Department Of Electric And Control Systems Engineering Interdisciplinary Faculty Of Science And Engineering Shimane University
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