Dependence of Magnetic Properties on Antiferromagnetic Layer in Exchange-coupled Bilayer

概要

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Exchange anisotropy between NiO antiferromagnetic layer and NiFe ferromagnetic layer has been investigated in Ta(5 nm)/NiFe(10 nm)/NiO(60 nm)/Si(100) formed by magnetron sputtering. NiO was sputtered from nickel oxide using R.F. power and NiFe, Ta were deposited using D. C. power under Ar atmosphere. Among the variables of sputtering conditions, our experimental data showed that the dominant factor for determining the exchange anisotropy properties was the Ar pressure during NiO deposition. The better exchange anisotropy properties were found when the NiO film was deposited at low Ar pressure probably due to the abrupt and flatten interface and the epitaxial tendency of NiO grains and NiFe grains. However, as Ar pressure increased, interfacial diffusion at NiFe/NiO interface and oxygen content of NiO film increased, and consequently reduced the exchange anisotropy. We concluded that the flatten and abrupt interface and relatively low oxygen content of NiO layer are dominating factors for the exchange anisotropy in NiFe/NiO bilayer.
社団法人日本磁気学会の論文
1999-01-20