超伝導永久磁石を用いたマグネトロンスパッタ装置

概要

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We constructed a planar magnetron sputtering apparatus, which employs a c-axis-aligned, single-domain Sm-Ba-Cu-O bulk superconductor 60 mm in diameter to generate a strong magnetic field. The magnetic field at the surface of the superconductor was 4.2 T, which is far larger than that of ordinary permanent magnets used in magnetron sputtering systems. The discharging characteristics of Cu, Ni, and Fe targets in the pressure range of 10^<-1> to 10^<-3> Pa were studied under different target voltages. Owing to the strong magnetic field generated by the superconducting bulk magnet, a stable discharge was observed even at 1 x 10^<-3> Pa. A sufficiently large deposition rate was observed in spite of the long target-to-substrate distance of 300 mm, including for ferromagnetic Ni and Fe targets. These results prove the high potential of superconducting bulk magnets to generate a strong magnetic field for magnetron sputtering.
社団法人日本磁気学会の論文
2003-05-01