回転塗布における膜厚変化過程の光干渉による計測

概要

論文の詳細を見る
A new technique has been developed for measuring the transient film thickness in a spin-coating process. Interference of a reflecting laser beam from film surface and film base is used in this technique. This laser beam is rotated synchronously with a spinning disk using a rotating prism which rotates at half the speed of the spinning disk. The rate of decrease in film thickness is obtained by measuring the frequency of change of the interference beam intensity. Using multiple laser beams, this technique allows simultaneous measurement at several arbitrary points. This technique has been applied to a photoresist spin-coating process to determine the dependence of the film thickness upon disk angular acceleration and photoresist viscosity. The rate of decrease in film thickness increases with the increase in angular acceleration and the decrease in viscosity. The change of the radius of the measuring position does not have much influence on the results.
一般社団法人日本機械学会の論文
1990-10-25